Semiconductor material and device characterization
Author(s)
Bibliographic Information
Semiconductor material and device characterization
Wiley, c1990
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Note
"A Wiley-Interscience publication."
Includes bibliographical references and index
Description and Table of Contents
Description
This detailed sourcebook provides an up-to-date description and unified treatment of the characterization techniques used in the semiconductor industry. It covers electrical, optical, electron- beam, ion-beam, X-ray and gamma ray methods. This information, until now scattered in journals and review papers, is presented in a unified manner with over 1300 references. It is also a valuable reference book on characterization methods.
Table of Contents
- Resistivity
- Carrier and Doping Concentration
- Contact Resistance and Schottky Barrier Height
- Series Resistance, Channel Length, Threshold Voltage
- Mobility
- Oxide and Interface Trapped Charge
- Deep-Level Impurities
- Carrier Lifetime
- Optical Characterization
- Chemical and Physical Characterization
- Appendixes
- Index.
by "Nielsen BookData"
