CiNii 図書 - Auger and x-ray photoelectron spectroscopy

The growth and diversification of surface analytical techniques began in the 1960s with the development of electron spectroscopy - first Auger electron spectroscopy (AES), closely followed by X-ray photo-electron spectroscopy (XPS or ESCA). Today these two complementary techniques still dominate the surface analysis scene. Although literature reviews of aspects of AES and XPS are legion a text is needed which reflects the new maturity of these techniques in a way which is useful practically, especially for newcomers to applied surface analysis. The aim of this book is to correct this omission and to present, in one volume, all of the important concepts and tabulated data. A brief introduction gives the historical background to AES and XPS and sets them in the perspective of surface analytical techniques as a whole. The essentials of technique are covered in chapters on instrumentation, spectral interpretation, depth profiling and quantification. The remaining chapters are intended to give an insight into the major fields of application, both in terms of the special attributes of AES and XPS and the contribution they have made. These fields are microelectronics, metallurgy, catalysis, polymer technology and corrosion science. Throughout, the underlying electron spectroscopy link between AES and XPS is stressed. Aspects of technique which have fundamental importance in day-to-day operation such as instrument calibration, XPS binding energy referencing and XPS data processing (especially complex curve resolution) are discussed the appendices. Finally there are full tabulations of major peak positions in AES and XPS, relative sensitivity factors for XPS and binding energy/Auger parameter data for elements and compounds.

A perspective on the analysis of surfaces and interfaces, M.P.Seah and D.Briggs
instrumentation, J.C.Riviere
spectral interpretation, D.Briggs and J.C.Riviere
depth profiling in AES and XPS, S.Hofmann
quantification of AES and XPS, M.P.Seah
AES in metallurgy, M.P.Seah
applications of electron spectroscopy to heterogeneous catalysis, Tery L.Barr
applications of XPS in polymer technology, D.Briggs
uses of augar electron and photelectron spectroscopies in corrosion science, N.S.McIntyre and T.C.Chan. Appendices: spectrometer energy scale calibration, M.P.Seah and G.C.Smith
charge referencing techniques for insulators, M.P.Seah
data analysis in XPS and AES, P.M.A.Sherwood
auger chemical shifts and the auger parameter, S.Waddington
photoelectron and augar energies and the augar parameter - a data set, C.D.Wagner
empirically derived atomic sensitivity factors for XPS
line positions form Mg X-rays, by element
line positions from A1 X-rays, by element
line positions from Mg X-rays in numerical order
line positions from A1 X-rays, in numerical order
kinetic energies of augar electrons - experimental data from spectra acquired by X-ray excitation, C.D.Wagner.

巻冊次: : paper ISBN 9780471953401

内容説明

This is an updated manual covering the theory and practice of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) techniques for surface analysis. Topics covered include historical development; all relevant theory for data interpretation and a description of instrumentation; the major fields of applications, such as metallurgy, polymers, semiconductors, and corrosion science; catalysis; and many appendices of essential data for day-to-day use. This new edition also takes into account improvements in equipment, experimental procedures and data interpretation over the last seven years.

Perspective on the Analysis of Surfaces and Interfaces
Instrumentation
Spectral Interpretation
Depth Profiling in AES and XPS
Quantification of AES and XPS
Applications of AES in Microelectronics
AES in Metallurgy
Applications of Electron Spectroscopy to Heterogeneous Catalysis
Applications of XPS in Polymer Technology
Uses of Auger Electron and Photoelectron Spectroscopies in Corrosion Science.

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Auger and x-ray photoelectron spectroscopy

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