Hazard assessment and control technology in semiconductor manufacturing
著者
書誌事項
Hazard assessment and control technology in semiconductor manufacturing
（Industrial hygiene science series）
Lewis Publishers, c1989
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注記
Papers presented at a symposium sponsored by the American Conference of Governmental Industrial Hygienists and others and held in Cincinnati, Ohio, Oct. 20-22, 1987
Includes bibliographies and index
内容説明・目次
内容説明
This valuable new book from ACGIH covers health studies, hazard control technology of manufacturing processes, catastrophic releases, and emerging technologies. An integral part of the industrial hygiene science series, this book will be of special interest to industrial hygienists, safety personnel, equipment and material suppliers, researchers, and government agencies.
目次
SECTION I-HEALTH STUDIES. Summary of Occupational Injuries and Illnesses in the Semiconductor Industry. A System for Collecting, Compiling and Evaluating Reports of Occupationally Related Injuries and Illnesses in the U.S. Semi-Conductor Industry. Analysis of Occupational Injury and Illness Reports in the Semiconductor Manufacturing Industry. Semiconductor Industry-A Hazard Surveillance Perspective. Results of Industrial Hygiene Sampling in Semi Conductor Manufacturing Operations. Spontaneous Abortion and General Illness Symptoms Among Semiconductor Manufacturers. Development of Rapid Test Systems to Identify Prenatal Toxic Chemicals and Chemical Mixtures Used in Semiconductor Production. Arsine: Toxicity Data from Acute and Short-Term Inhalation Exposures. Glycol Ether Hazards to Reproductive Health: An Update. SECTION II-CATASTROPHIC RELEASES. Evaluating Risks Associated with the Use of Saline. Risk Assessment and Control of Toxic Gas Releases. Continuous Monitoring to Detect Episodic Releases of Toxic Gases. SECTION III-HAZARD CONTROL TECHNOLOGY. Toxic Gas Health and Safety Controls for Semiconductor Manufacturing. Ion Implanters-Chemical and Radiation Safety. Safety and Health Implications of Dry Chemical Etching. Safety and Environmental Control Systems Used in Chemical Vapor Deposition (CVD) Reactors at AT&T-C&ES-Reading. Characterization of Hazardous-Gas Releases by Tracer-Gas Simulation. Diffusion and Deposition Furnaces: Hazard Control Systems. SECTION IV: EMERGING TECHNOLOGIES. Control Methods for Metals and Metalloids in III-V Materials Vaporphase Epitaxy. Fourier Infrared Spectroscopic Methods for Industrial Hygiene Air Monitoring-II: Semiconductor Process Gases. Safety and Health Considerations of an X-Ray Lithography Source. Approaches for Identifying, Characterizing and Managing Risks from Accidentally Released Toxic Gases. Assessment of Exposure in Gallium Arsenide Processing: A Case Study. Hydride Replacements in Semiconductor Fabrication.
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