Studies on structural properties of silicon-based insulator films prepared by plasma processings

Author(s)

• 平尾, 孝 ヒラオ, タカシ

Bibliographic Information

Studies on structural properties of silicon-based insulator films prepared by plasma processings

by Takashi Hirao

Takashi Hirao, 1989

Other Title

プラズマプロセスによるSi系絶縁薄膜の構造的特性に関する研究

Note

Thesis(doctoral) -- Kanazawa University, 1989, 学博乙第4号

Details

• NCID: BA12416484
• Country Code: ja
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Kanazawa
• Pages/Volumes: 159p
• Size: 31cm