Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Author(s)

• Yanof, Arnold W.
• Society of Photo-optical Instrumentation Engineers
• SPIE Symposium on Microlithography

Bibliographic Information

Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California

Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1089）

SPIE, c1989

Note

Proceedings of the SPIE Symposium on Microlithography

Includes bibliographical references

Details

• NCID: BA12683130
• ISBN:
  • 0819401242
• LCCN: 89060655
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: viii, 388 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC20 : 621.381/52
• Subject Headings:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X