Handbook of contamination control in microelectronics : principles, applications, and technology

Bibliographic Information

Handbook of contamination control in microelectronics : principles, applications, and technology

edited by Donald L. Tolliver

(Materials science and process technology series)

Noyes Publications, c1988

Available at  / 4 libraries

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Includes bibliographies and index

Description and Table of Contents

Description

This book introduces contamination control in a comprehensive manner. It covers the basics for the beginner, and delves in depth into the more critical issues of process engineering and circuit manufacturing for the more advanced reader. The reader will begin to see how the puzzle of contamination control comes together and to focus on the fundamentals required for excellence in modern semiconductor manufacturing. What makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control. This handbook defines and describes most of the major categories in current contamination control technology.

Table of Contents

Aerosol Filtration Technology Instrumentation for Aerosol Measurement Clean Room Garments and Fabrics Guidelines for Clean Room Management and Discipline Electrostatics in Clean Rooms Ultra High Purity Water-New Frontiers Deionized (DI) Water Filtration Technology Monitoring System for Semiconductor Fluids Particles in Ultrapure Process Gases Contamination Control and Concerns in VLSI Lithography Contamination Control in Electronic Chemicals Surface Particle Detection Technology Particle Contamination by Process Equipment Wafer Automation and Transfer System Conclusion References Glossary Index

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