書誌事項

Silicon nitride in microelectronics and solar cells

authors, Eberhard F. Krimmel, Rudolf Hezel ; editor, Alfred Pebler ; chief editor, Friedrich Schröder

(Gmelin handbook of inorganic chemistry / prepared and issued by Gmelin-Institut für Anorganische Chemie der Max-Planck-Gesellschaft zur Förderung der Wissenschaften ; director, Ekkehard Fluck, system no. 15 . Si, silicon ; suppl. v. B5c)

Springer, 1991

  • : gw
  • : us

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注記

"Literature closing date: January 1990 in some cases more recent data have been considered"

内容説明・目次

内容説明

This is the first of three Gmelin Handbook volumes in the silicon se ries that will cover silicon nitride, a normaUy solid material with the idealized formula Si N . This volume, 3 4 "Silicon" Supplement Volume B Sc, is devoted to applications of silicon nitride in microelec- tronics and solar ceUs. The compendium is the product of a critical selection among more than 17600 publications on silicon nitride issued up to January 1990. Out of a total of 5900 publications dealing with the fabrication and use of microelectronic devices (including 2400 Japanese patent applications), about 4000 papers have been selected for this volume. The current volume is grouped into three parts. Chapters 2 to 8 deal with general, non- specific microelectronic applications of silicon nitride, Chapters 9 to 31 cover applications of silicon nitride in specific devices and device components, and Chapter 32 is devoted exclusively to applications in solar ceUs, including information on our general understanding of the role of silicon nitride in photovoltaic devices. Experimental results on the preparation of silicon nitride layers for application in unspeci- fied devices are in Chapter 2. Whenever the preparation is in connection with specific devices, the information is presented in the respective chapters. The general preparation of silicon nitride layers is not covered in this volume, but will appear in "Silicon" Supplement Volume B 5a. See also the Introductory Remarks, Chapter 1, p. 1.

目次

1 Introductory Remarks.- 2 Preparation and Patterning of Silicon Nitride Layers and Films.- 3 Silicon Nitride Application as Masks.- 4 Insulating Silicon Nitride Films.- 5 Silicon Nitride for Gettering.- 6 Silicon Nitride for Protecting and Passivating Devices. Improving the Radiation Resistance.- 7 Silicon Nitride in Encapsulation and Recrystallization.- 8 Silicon Nitride Applied for the Manufacture of Contacts and Interconnections.- 9 Silicon Nitride for Isolating Devices and Device Components.- 10 Silicon Nitride in Resistor Fabrication.- 11 Silicon Nitride Dielectrics and Masks in Capacitors.- 12 Silicon Nitride as Mask and Dielectric in Field Effect Devices.- 13 Silicon Nitride Substrates, Masks and Dielectrics in Thin-Film Devices on Insulators.- 14 Charge-Coupled Devices (CCDs).- 15 Schottky Diodes.- 16 Silicon Nitride in Bipolar Devices (Diodes, Transistors and Thyristors).- 17 Silicon Nitride in Integrated Circuit (IC) Technology.- 18 Silicon Nitride in Field Effect Transistor-Based Integrated Circuits (FET ICs).- 19 Silicon Nitride in Bipolar Device-Based Integrated Circuits.- 20 Silicon Nitride in Random Access Memories (RAMs).- 21 Read-Only Memories (ROMs).- 22 Silicon Nitride in Compound Semiconductor Field Effect Transistors.- 23 Silicon Nitride in Light-Emitting Diodes (LEDs), Lasers and Displays.- 24 Silicon Nitride in Photoelectric Devices.- 25 Silicon Nitride in Compound Semiconductor Integrated Circuits (ICs).- 26 Silicon Nitride in Integrated Optics.- 27 Silicon Nitride in Epitaxy and Superlattices.- 28 Silicon Nitride in High-Tc Superconductor and Superconducting Device Technology.- 29 Silicon Nitride in Sensors.- 30 Silicon Nitride in Magnetic Devices.- 31 Specific Applications of Silicon Nitride Films.- 32 Application of Silicon Nitride for Solar Cells.- Abbreviations and Acronyms.- Physical Constants and Conversion Factors.

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  • Gmelin handbook of inorganic chemistry

    prepared and issued by Gmelin-Institut für Anorganische Chemie der Max-Planck-Gesellschaft zur Förderung der Wissenschaften ; director, Ekkehard Fluck

    Springer-Verlag 1975- 8th ed. = 8., völlig neu bearbeitete Aufl. / founded by Leopold Gmelin ; 8th edition begun under the auspices of the Deutsche Chemische Gesellschaft by R.J. Meyer ; continued by E.H.E. Pietsch and A. Kotowski, and by Margot Becke-Goehring

    Formula index. 1st suppl. v. 1 : gw , Formula index. 1st suppl. v. 1 : us , Formula index. 1st suppl. v. 2 : gw , Formula index. 1st suppl. v. 2 : us , Formula index. 1st suppl. v. 3 : gw , Formula index. 1st suppl. v. 3 : us , Formula index. 1st suppl. v. 4 : gw , Formula index. 1st suppl. v. 4 : us , Formula index. 1st suppl. v. 5 : gw , Formula index. 1st suppl. v. 5 : us , Formula index. 1st suppl. v. 6 : gw , Formula index. 1st suppl. v. 6 : us , Formula index. 1st suppl. v. 7 : gw , Formula index. 1st suppl. v. 7 : us , Formula index. 1st suppl. v. 8 : gw , Formula index. 1st suppl. v. 8 : us , Formula index. 2nd suppl. v. 1 : gw , Formula index. 2nd suppl. v. 1 : us , Formula index. 2nd suppl. v. 2 : gw , Formula index. 2nd suppl. v. 2 : us , Formula index. 2nd suppl. v. 3 : gw , Formula index. 2nd suppl. v. 3 : us , Formula index. 2nd suppl. v. 4 : gw , Formula index. 2nd suppl. v. 4 : us , Formula index. 2nd suppl. v. 5 : gw , Formula index. 2nd suppl. v. 5 : us , Formula index. 2nd suppl. v. 6 : gw , Formula index. 2nd suppl. v. 6 : us , Formula index. 2nd suppl. v. 7 : gw , Formula index. 2nd suppl. v. 7 : us , Formula index. 2nd suppl. v. 8 : gw , Formula index. 2nd suppl. v. 8 : us , Formula index. 2nd suppl. v. 9 : gw , Formula index. 2nd suppl. v. 9 : us , Formula index. 2nd suppl. v. 10 : gw , Formula index. 2nd suppl. v. 10 : us

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詳細情報

  • NII書誌ID(NCID)
    BA13156378
  • ISBN
    • 3540936300
    • 0387936300
  • LCCN
    25001383
  • 出版国コード
    gw
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Berlin ; Tokyo
  • ページ数/冊数
    xv, 400 p.
  • 大きさ
    26 cm
  • 親書誌ID
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