Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California

Author(s)

• Blais, Phillip D.
• Society of Photo-optical Instrumentation Engineers

Bibliographic Information

Electron-beam, x-ray, and ion-beam lithographies VI : [proceedings] 5-6 March 1987, Santa Clara, California

Phillip D. Blais, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 773）

The Society, c1987

• pbk.

Note

Includes bibliographies and index

• NCID: BA13293696
• ISBN:
  • 0892528087
• LCCN: 87060741
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: vi, 265 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC19 : 621.3815/2
• Subject Headings:
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : X-ray lithography -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X