Monte Carlo device simulation : full band and beyond
Author(s)
Bibliographic Information
Monte Carlo device simulation : full band and beyond
(The Kluwer international series in engineering and computer science, SECS 144)
Kluwer Academic, c1991
Available at 10 libraries
  Aomori
  Iwate
  Miyagi
  Akita
  Yamagata
  Fukushima
  Ibaraki
  Tochigi
  Gunma
  Saitama
  Chiba
  Tokyo
  Kanagawa
  Niigata
  Toyama
  Ishikawa
  Fukui
  Yamanashi
  Nagano
  Gifu
  Shizuoka
  Aichi
  Mie
  Shiga
  Kyoto
  Osaka
  Hyogo
  Nara
  Wakayama
  Tottori
  Shimane
  Okayama
  Hiroshima
  Yamaguchi
  Tokushima
  Kagawa
  Ehime
  Kochi
  Fukuoka
  Saga
  Nagasaki
  Kumamoto
  Oita
  Miyazaki
  Kagoshima
  Okinawa
  Korea
  China
  Thailand
  United Kingdom
  Germany
  Switzerland
  France
  Belgium
  Netherlands
  Sweden
  Norway
  United States of America
Note
Includes bibliographical references and index
Description and Table of Contents
Description
Monte Carlo simulation is now a well established method for studying semiconductor devices and is particularly well suited to highlighting physical mechanisms and exploring material properties. Not surprisingly, the more completely the material properties are built into the simulation, up to and including the use of a full band structure, the more powerful is the method. Indeed, it is now becoming increasingly clear that phenomena such as reliabil ity related hot-electron effects in MOSFETs cannot be understood satisfac torily without using full band Monte Carlo. The IBM simulator DAMOCLES, therefore, represents a landmark of great significance. DAMOCLES sums up the total of Monte Carlo device modeling experience of the past, and reaches with its capabilities and opportunities into the distant future. This book, therefore, begins with a description of the IBM simulator. The second chapter gives an advanced introduction to the physical basis for Monte Carlo simulations and an outlook on why complex effects such as collisional broadening and intracollisional field effects can be important and how they can be included in the simulations. References to more basic intro the book. The third chapter ductory material can be found throughout describes a typical relationship of Monte Carlo simulations to experimental data and indicates a major difficulty, the vast number of deformation poten tials required to simulate transport throughout the entire Brillouin zone. The fourth chapter addresses possible further extensions of the Monte Carlo approach and subtleties of the electron-electron interaction.
Table of Contents
1. Numerical Aspects and Implementation of the DAMOCLES Monte Carlo Device Simulation Program.- 2. Scattering Mechanisms for Semiconductor Transport Calculations.- 3. Evaluating Photoexcitation Experiments Using Monte Carlo Simulations.- 4. Extensions of the Monte Carlo Simulation in Semiconductors to Fast Processes.- 5. Theory and Calculation of the Deformation Potential Electron-Phonon Scattering Rates in Semiconductors.- 6. Ensemble Monte Carlo Investigation of Nonlinear Transport Effects in Semiconductor Heterostructure Devices.- 7. Monte Carlo Simulation of Quasi-One-Dimensional Systems.- 8. The Application of Monte Carlo Techniques in Advanced Hydrodynamic Transport Models.- 9. Vectorization of Monte Carlo Algorithms for Semiconductor Simulation.- 10. Full Band Monte Carlo Program for Electrons in Silicon.
by "Nielsen BookData"