Plasma chemical processing

著者

• Benenson, David M.
• Pfender, Emil
• Chase, J. D.
• American Institute of Chemical Engineers

書誌事項

Plasma chemical processing

David M. Benenson and Emil Pfender, editors ; J.D. Chase ... [et al.]

（AIChE symposium series, no. 186, v. 75）

American Institute of Chemical Engineers, 1979

注記

"Comprises the majority of the papers presented during four sessions on Plasma Chemical Processing at the 82nd National Meeting of the AIChE in Atlantic City, N.J., from August 29 to September 1, 1976."--Foreword

Includes bibliographical references

• NII書誌ID(NCID): BA13618134
• LCCN: 79015552
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: New York
• ページ数/冊数: v, 92 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TP156.P5
  • DC : 660/.04/4
• 件名:
  • LCSH : Plasma chemistry -- Industrial applications -- Congresses
• 親書誌ID:
  • BA01349578