4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979

Author(s)

• International Symposium on Plasma Chemistry
• Vepřek, S.
• Hertz, J.
• Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces
• Round Table on Thermal Plasma Processing
• International Union of Pure and Applied Chemistry

Bibliographic Information

4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979

edited by S. Vepřek and J. Hertz

University of Zurich, [1979]

• 1
• 2

Note

At head of title: ISPC-4; International Union of Pure and Applied Chemistry

Includes bibliographical references and indexes

Details

• NCID: BA14448459
• LCCN: 81481907
• Country Code: sz
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Zurich, Switzerland
• Pages/Volumes: 2 v.
• Size: 21 cm
• Classification:
  • LCC : QD581
  • DC19 : 541/.0424
• Subject Headings:
  • LCSH : Plasma chemistry -- Congresses