4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979

著者

• International Symposium on Plasma Chemistry
• Vepřek, S.
• Hertz, J.
• Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces
• Round Table on Thermal Plasma Processing
• International Union of Pure and Applied Chemistry

書誌事項

4th International Symposium on Plasma Chemistry : Topical Meeting on Interactions of Low Pressure Plasmas with Solid Surfaces : Round Table on Thermal Plasma Processing : conference proceedings, August 27 through September 1, 1979

edited by S. Vepřek and J. Hertz

University of Zurich, [1979]

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注記

At head of title: ISPC-4; International Union of Pure and Applied Chemistry

Includes bibliographical references and indexes

• NII書誌ID(NCID): BA14448459
• LCCN: 81481907
• 出版国コード: sz
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Zurich, Switzerland
• ページ数/冊数: 2 v.
• 大きさ: 21 cm
• 分類:
  • LCC : QD581
  • DC19 : 541/.0424
• 件名:
  • LCSH : Plasma chemistry -- Congresses