Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing : 6-7 March 1991, San Jose, California
（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1465）
SPIE, c1991
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注記
"Part of a two-conference program ... held at the SPIE Symposium on Microlithography, 3-8 March 1991"--P. viii
Includes bibliographical references and index