Thin films for emerging applications

著者

• Francombe, Maurice H.
• Vossen, John L.

書誌事項

Thin films for emerging applications

edited by Maurice H. Francombe and John L. Vossen

（Physics of thin films : advances in research and development, v. 16）

Academic Press, 1992

内容説明・目次

内容説明

Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.

目次

N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.

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詳細情報

• NII書誌ID(NCID): BA18193611
• ISBN:
  • 0125330162
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: San Diego
• ページ数/冊数: xii, 367 p.
• 大きさ: 24 cm
• 分類:
  • NDC8 : 549.8
• 親書誌ID:
  • BA04340456