Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Author(s)

• International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
• Rużyłło, Jerzy
• Novak, Richard E.
• Electrochemical Society. Electronics Division
• Electrochemical Society. Dielectric Science and Technology Division

Bibliographic Information

Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

edited by Jerzy Ruzyllo, Richard E. Novak ; [sponsored by the] Electronics and Dielectric Science and Technology Divisions

（Proceedings / [Electrochemical Society], v. 92-12）

Electrochemical Society, c1992

Note

"Held at the Electrochemical Society Fall Meeting in Phoenix, Arizona, October 14-18, 1992"--P. iii

Includes bibliographical references and indexes

Details

• NCID: BA18281537
• ISBN:
  • 1566770122
• LCCN: 92071447
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Pennington, NJ (10 South Main St., Pennington 08534-2896)
• Pages/Volumes: xi, 502 p.
• Size: 23 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• Subject Headings:
  • LCSH : Semiconductor wafers -- Cleaning -- Congresses
• Parent Bibliography ID:
  • BA01323290