Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

著者

• International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
• Rużyłło, Jerzy
• Novak, Richard E.
• Electrochemical Society. Electronics Division
• Electrochemical Society. Dielectric Science and Technology Division

書誌事項

Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

edited by Jerzy Ruzyllo, Richard E. Novak ; [sponsored by the] Electronics and Dielectric Science and Technology Divisions

（Proceedings / [Electrochemical Society], v. 92-12）

Electrochemical Society, c1992

注記

"Held at the Electrochemical Society Fall Meeting in Phoenix, Arizona, October 14-18, 1992"--P. iii

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA18281537
• ISBN:
  • 1566770122
• LCCN: 92071447
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, NJ (10 South Main St., Pennington 08534-2896)
• ページ数/冊数: xi, 502 p.
• 大きさ: 23 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• 件名:
  • LCSH : Semiconductor wafers -- Cleaning -- Congresses
• 親書誌ID:
  • BA01323290