Chemical vapor deposited materials
著者
書誌事項
Chemical vapor deposited materials
CRC Press, c1991
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
Chemical Vapor Deposited Materials presents a concise description of the preparation, structure, and properties of some of the most important CVD materials needed in the development of high temperature technology. Topics covered include SiC, Si3N4, and BN, as well as other carbides, borides, and nitrides. The author incorporates information from the literature with data from his own experience, which makes the book useful for improving tool bits, increasing the wear resistance of materials, and increasing the oxidation resistance and toughness of composite materials. Researchers, scientists, and students involved in the preparation of CVD materials will find this book to be a valuable companion in their work.
目次
INTRODUCTION. Equipment. Growth Process. Chemical Equilibrium. Coating Thickness. Applications. CVD Si3N4. Preparation. Structure. Properties. Oxidation. Applications. CVD SiC. Preparation. Structure. Properties. Oxidation. Applications. CVD BN. Preparation. Structure. Properties. Oxidation. Applications. OTHER CVD MATERIALS. CVD Materials. Aluminum. Aluminum Nitride. Aluminium Oxide. Boron. Boron Carbide. Carbon. Cobalt. Hafnium. Hafnium Carbide. Hafnium Nitride. Iron. Molybdenum. Molybdenum Boride. Molybdenum Carbide. Molybdenum Silicide. Nickel. Niobium. Niobium Carbide. Rhenium. Tantalum. Tantalum Boride. Tantalum Carbide. Tantalum Nitride. Titanium. Titanium Boride. Titanium Carbide. Titanium Nitride. Titanium Silicide. Tungsten. Tungsten Boride. Tungsten Carbide. Tungsten Silicide. Zirconium. Zirconium Boride. Zirconium Nitride. Zirconium Oxide. Index.
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