Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

Author(s)

• Rossnagel, Stephen M.
• Cuomo, J. J.
• Westwood, William D. (William Dickson)

Bibliographic Information

Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions

edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood

（Materials science and process technology series）

Noyes Publications, c1990

Note

Includes bibliographical references and index

Details

• NCID: BA18754617
• ISBN:
  • 0815512201
• LCCN: 89022834
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Park Ridge, N.J.
• Pages/Volumes: xxiii, 523 p.
• Size: 25 cm
• Classification:
  • LCC : TA2020
  • DC19 : 621.044
• Subject Headings:
  • LCSH : Plasma engineering
  • LCSH : Semiconductors -- Etching
  • LCSH : Plasma etching
• Parent Bibliography ID:
  • BA04523161