Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions
Author(s)
Bibliographic Information
Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions
（Materials science and process technology series）
Noyes Publications, c1990
Available at / 14 libraries
-
No Libraries matched.
- Remove all filters.
Note
Includes bibliographical references and index
Description and Table of Contents
Description
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
Table of Contents
Techniques for IC ProcessingIntroduction to Plasma Concepts and Discharge ConfigurationsFundamentals of Sputtering and ReflectionBombardment-Induced Compositional Changes with Alloys, Oxides, Oxysalts, and HalidesRF Diode Sputter Etching and DepositionMagnetron Plasma Deposition ProcessesBroad-Beam Ion SourceReactive Ion EtchingReactive Sputter DepositionPlasma Enhanced Chemical Vapor Deposition of Thin Films for MicroelectronicsElectron Cyclotron Resonance Microwave Discharges for Etching and Thin Film DepositionHollow Cathode Etching and DepositionIon PlatingIonized Cluster Beam (ICB) Deposition TechniquesThe Activated Reactive Evaporation (ARE) ProcessFormation of Thim Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)Selective Bias Sputter DepositionVacuum Arc-Based ProcessingIon Source Interactions: General UnderstandingsIon Assisted DepositionMicrostructural Control of Plasma-Sputtered Refractory Coatings
by "Nielsen BookData"
