Plasma technology : fundamentals and applications

著者

• Capitelli, M.
• Gorse, Claudine

書誌事項

Plasma technology : fundamentals and applications

edited by Mario Capitelli and Claudine Gorse

Plenum Press, c1992

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Surveys the role of plasma physics and chemistry in various fields of technology, such as lamps, the treatment of materials, plasma sources for microwave excitation, and the plasma destruction of pollutants. Among the topics are basic concepts, nonequilibrium modelling, diagnostics, and laser intera

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詳細情報

• NII書誌ID(NCID): BA19037247
• ISBN:
  • 0306442078
• LCCN: 92013625
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: New York
• ページ数/冊数: viii, 224 p.
• 大きさ: 26 cm
• 分類:
  • LCC : TA2030
  • DC20 : 621.044
• 件名:
  • LCSH : Plasma devices -- Congresses
  • LCSH : Plasma (Ionized gases) -- Congresses