Handbook of VLSI microlithography : principles, technology, and applications

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書誌事項

Handbook of VLSI microlithography : principles, technology, and applications

edited by William B. Glendinning, John N. Helbert

（Materials science and process technology series）

Noyes Publications, c1991

大学図書館所蔵 件 / 全4件

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

目次

Issues and Trends Affecting Lithography Tool Selection Strategy Resist Technology u Design, Processing, and Applications Lithography Process Monitoring and Defect Detection Techniques and Tools for Photo Metrology Techniques and Tools for Optical Lithography Microlithography Tool Automation Electron-Beam ULSI Applications Rational Vibration and Structural Dynamics for Lithographic Tool Installations Applications of Ion Microbeams Lithography and Direct Processing X-Ray Lithography Part I Part II Acknowledgment References Index

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