Modeling of chemical vapor deposition of tungsten films

Author(s)

• Kleijn, Chris R.
• Werner, Christoph

Bibliographic Information

Modeling of chemical vapor deposition of tungsten films

Chris R. Kleijn, Christoph Werner

（Progress in numerical simulation for microelectronics, vol. 2）

, 1993

• : Basel
• : Boston

Note

Includes bibliographical references

Details

• NCID: BA2058796X
• ISBN:
  • 3764328584
  • 0817628584
• LCCN: 92044681
• Country Code: sz
• Title Language Code: eng
• Text Language Code: und
• Place of Publication: Basel Birkhäuser Verlag
• Pages/Volumes: 138 p.
• Size: 23 cm
• Classification:
  • LCC : TK7871.15.F5
  • DC20 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductor films -- Mathematical models
  • LCSH : Vapor-plating -- Mathematical models
• Parent Bibliography ID:
  • BA12786213