Irradiation of polymeric materials : processes, mechanisms, and applications
Author(s)
Bibliographic Information
Irradiation of polymeric materials : processes, mechanisms, and applications
（ACS symposium series, 527）
American Chemical Society, 1993
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"Developed from a symposium sponsored by the Polymer Division of the Royal Australian Chemical Institute, the National Science Foundation of the United States, and the Department of Industry, Technology, and Commerce of the Australian Government."
Includes bibliographical references and indexes
Description and Table of Contents
Description
Provides a current view of activities related to the radiation chemistry of polymers, including mechanisms, processes, and applications. Emphasizes the fundamental aspects of polymer radiation chemistry and the technological significance of the effects of radiation on polymers. Discusses the fundamental processes by which radiation interacts with polymers. Highlights the mechanisms that create chemical changes in polymeric materials. Presents applications in the microlithography, aerospace, and biomedical fields and other applications of radiation modified polymers.
Table of Contents
- Radiation Effects on Polymeric Materials: A Brief Overview
- Dosimetry: The Forgotten Art
- Heterogeneous Nature of Radiation Effect on Polymers
- Temperature Effects on the Radiation Degradation of Poly(isobutene) and Poly(*a-methylstyrene)
- Radiolytic Formation and Decay of trans-Vinylene Unsaturation in Polyethylene
- Radiation-Induced Structural Changes in Polychloroprene
- Applications of Radiation Treatment of Ultradrawn Polyethylene
- Role of Homopolymer Suppressors in UV and Radiation Grafting in the Presence of Novel Additives: Significance of Processes in Analogous Curing Reactions
- Photoinitiated Polymerization of Liquid Crystalline Monomers Bearing Nonaromatic Mesogenic Units
- Electronic Structure, Photophysics, and Photochemistry of Polysilanes
- Excitation-Energy Migration and Trapping in Photoirradiated Polymers
- Structure of Polymer Films Studied with Picosecond Total Internal Reflection Fluorescence Spectroscopy
- X-ray and Deep UV Radiation Response of t-Butoxycarbonyl-Protected 4-Hydroxystyrene-Sulfone Copolymers
- Polarity Change for the Design of Chemical Amplification Resists
- Chemically Amplified X-ray Resists
- Diazonaphthoquinone-Novolac Resist Dissolution in Composite Langmuir-Blodgett and Spin-Cast Films
- New Photoresist Processes at UV Wavelengths Less Than 200 Nanometers
- Space Environmental Effects on Selected Long Duration Exposure Facility Polymeric Materials
- Characterization of Matrix Polymers for Electron-Beam-Cured Fiber-Reinforced Composites
- Radiation Effects on Polymers of Biomedical Significance
- Copolymerization of Glycolide with Polymeric Radiostabilizers for the Preparation of Radiation Sterilizable Braided Sutures
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