Hydrogenated amorphous silicon alloy deposition processes
著者
書誌事項
Hydrogenated amorphous silicon alloy deposition processes
（Applied physics, 1）
M. Dekker, c1993
大学図書館所蔵 全4件
注記
Includes bibliographical references (p. 243-316) and index
内容説明・目次
内容説明
This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.
目次
- Introduction
- material characteristics of amorphous silicon-based alloys
- film diagnostic measurements
- conventional glow discharge deposition processes for amorphous silicon-based alloys
- design of glow discharge deposition reactors
- glow discharge deposition parameters for hydrogenated amorphous silicon
- glow discharge deposition reaction chemistry for hydrogenated amorphous silicon
- modifications of conventional glow discharge
- remote-plasma-assisted chemical vapour deposition methods
- photochemical vapour deposition
- thermally-induced chemical vapour deposition
- physical vapour deposition methods
- etching properties of amorphous silicon-based alloys
- comparison of alternative deposition methods
- microcrystalline silicon and silicon carbide
- safety.
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