Hydrogenated amorphous silicon alloy deposition processes

Author(s)

• Luft, Werner
• Tsuo, Y. Simon

Bibliographic Information

Hydrogenated amorphous silicon alloy deposition processes

Werner Luft, Y. Simon Tsuo

（Applied physics, 1）

M. Dekker, c1993

Note

Includes bibliographical references (p. 243-316) and index

Details

• NCID: BA20820408
• ISBN:
  • 0824791460
• LCCN: 93018931
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: New York
• Pages/Volumes: xiv, 327 p.
• Size: 24 cm
• Classification:
  • LCC : TK7872.T55
  • DC20 : 621.3815/2
• Subject Headings:
  • LCSH : Thin film devices -- Design and construction
  • LCSH : Silicon alloys
  • LCSH : Plasma-enhanced chemical vapor deposition
  • LCSH : Thin films -- Optical properties
  • LCSH : Thin films -- Electric properties
• Parent Bibliography ID:
  • BA20820485