Resists in microlithography and printing

Author(s)

• Bednar, J. Bee
• Králíček, Jaroslav
• Zachoval, Jaromír

Bibliographic Information

Resists in microlithography and printing

Bohumil Bednář, Jaroslav Králíček, and Jaromír Zachoval ; with contributions by Andrey V. Yelcov and Tatyana A. Yurre

（Materials science monographs, 76）

Elsevier, 1993

2nd rev. ed

Other Title

Litografické techniky

Uniform Title

Litografické techniky

Note

Translation of: Litografické techniky

Includes bibliographical references and index

Details

• NCID: BA20897060
• ISBN:
  • 0444988467
• LCCN: 92005585
• Country Code: ne
• Title Language Code: eng
• Text Language Code: eng
• Original Language Code: cze
• Place of Publication: Amsterdam ; Tokyo
• Pages/Volumes: 376 p.
• Size: 25 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• Subject Headings:
  • LCSH : Semiconductors -- Design and construction
  • LCSH : Integrated circuits -- Very large scale integration -- Design and construction
  • LCSH : Microlithography
  • LCSH : X-ray lithography
  • LCSH : Lithography, Electron beam
• Parent Bibliography ID:
  • BA00014483