Layered structures and interface kinetics : their technology and applications

著者

• 古川, 静二郎 フルカワ, セイジロウ
• US-Japan Seminar on "Solid Phase Epitaxy and Interface Kinetics"
• National Science Foundation (U.S.)
• 日本学術振興会 ニホン ガクジュツ シンコウカイ

書誌事項

Layered structures and interface kinetics : their technology and applications

edited by S. Furukawa

KTK Scientific , Reidel , Distributed in the U.S.A. and Canada by Kluwer, c1985

統一タイトル

Silicon-on-insulator

注記

"Papers presented in US-Japan Seminar on "Solid Phase Epitaxy and Inferface Kinetics" held in Oise, Japan, June 20-24, 1983 ... co-sponsored by the National Science Foundation and Japan Society for the Promotion of Science"--Pref

Companion volume containing the other papers presented at seminar published under title: Silicon-on-insulator

"ASST, advances in solid state technology."

Includes bibliographical references and index

• NII書誌ID(NCID): BA21044799
• ISBN:
  • 902771939X
• LCCN: 84027530
• 出版国コード: ja
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Tokyo,Dordrecht [Netherlands] ; Boston,Hingham, MA, U.S.A.
• ページ数/冊数: viii, 369 p.
• 大きさ: 24 cm
• 分類:
  • LCC : TK7871.85
  • DC19 : 621.381
• 件名:
  • LCSH : Solid state electronics -- Congresses
  • LCSH : Integrated circuits -- Design and construction -- Congresses
  • LCSH : Layer structure (Solids)
  • LCSH : Epitaxy -- Congresses
  • LCSH : Silicon-on-insulator technology