The physics and chemistry of SiO[2] and the Si-SiO[2] interface 2

Author(s)

• Helms, C. Robert
• Deal, Bruce E.
• Electrochemical Society. Electronics Division
• Electrochemical Society. Dielectric Science and Technology Division
• Symposium on the Physics and Chemistry of the SiO[2] and Si-SiO[2] Interface (2nd : 1992 : St. Louis, Mo.)

Bibliographic Information

The physics and chemistry of SiO[2] and the Si-SiO[2] interface 2

edited by C. Robert Helms and Bruce E. Deal

Plenum Press, c1993

Note

Proceedings of the Second Symposium on the Physics and Chemistry of the SiO[2] and Si-SiO[2] Interface, held May 18-21, 1992, in St. Louis, Missouri, sponsored by the Electronics Division and the Dielectric Science and Technology Division of the Electrochemical Society

Includes bibliographical references and index

• NCID: BA21102079
• ISBN:
  • 0306444194
• LCCN: 93014058
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: New York
• Pages/Volumes: xvi , 503p.
• Size: 26cm
• Classification:
  • LCC : QC585.75.S55
  • DC20 : 546/.6832
• Subject Headings:
  • LCSH : Silica -- Surfaces -- Congresses
  • LCSH : Dielectrics -- Surfaces -- Congresses
  • LCSH : Silicon dioxide films -- Congresses
  • LCSH : Surface chemistry -- Congresses
  • LCSH : Surfaces (Technology) -- Congresses