Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, amd Thin Insulator Materials

著者

• Symposium on Interconnects, Contact Metallization, and Multilevel Metallization
• Symposium on Reliability for Semiconductor Devices, Interconnects, and Thin Insulator
• Herndon, T. O.
• Rathore, H. S.
• Electrochemical Society. Dielectric Science and Technology Division
• Electrochemical Society. Electronics Division

書誌事項

Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, amd Thin Insulator Materials

edited by T.O. Herndon, H.S. Rathore ... [et al.] ; [sponsored by the] Dielectric Sicence and Technology and Electronics Divisions

（Proceedings / [Electrochemical Society], v. 93-25）

Electrochemical Society, c1993

注記

Includes bibliographical references and indexes

• NII書誌ID(NCID): BA21695367
• ISBN:
  • 156677067X
• LCCN: 93070069
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pennington, NJ
• ページ数/冊数: xiii, 494 p.
• 大きさ: 23 cm
• 親書誌ID:
  • BA01323290