Surface chemical cleaning and passivation for semiconductor processing

著者

• Higashi, Gregg S.
• Irene, Eugene A.
• 大見, 忠弘 オオミ, タダヒロ
• Materials Research Society. Meeting (1993 : San Francisco, Calif.). Symposium Y

書誌事項

Surface chemical cleaning and passivation for semiconductor processing

editors, Gregg S. Higashi, Eugene A. Irene, Tadahiro Ohmi

（Materials Research Society symposium proceedings, v. 315）

Materials Research Society, 1993

注記

Symposium Y held during the 1993 Spring Meeting of the Materials Research Society, in San Francisco from April 13-15, 1993

Includes bibliographical references and index

• NII書誌ID(NCID): BA22970911
• ISBN:
  • 1558992138
• LCCN: 93028784
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Pittsburgh, PA
• ページ数/冊数: xi, 518 p.
• 大きさ: 24 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.3815/2
• 件名:
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Surface preparation -- Congresses
  • LCSH : Semiconductors -- Cleaning -- Congresses
  • LCSH : Surface chemistry -- Congresses
• 親書誌ID:
  • BA00013775