Surface chemical cleaning and passivation for semiconductor processing

Author(s)

• Higashi, Gregg S.
• Irene, Eugene A.
• 大見, 忠弘 オオミ, タダヒロ
• Materials Research Society. Meeting (1993 : San Francisco, Calif.). Symposium Y

Bibliographic Information

Surface chemical cleaning and passivation for semiconductor processing

editors, Gregg S. Higashi, Eugene A. Irene, Tadahiro Ohmi

（Materials Research Society symposium proceedings, v. 315）

Materials Research Society, 1993

Note

Symposium Y held during the 1993 Spring Meeting of the Materials Research Society, in San Francisco from April 13-15, 1993

Includes bibliographical references and index

Details

• NCID: BA22970911
• ISBN:
  • 1558992138
• LCCN: 93028784
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Pittsburgh, PA
• Pages/Volumes: xi, 518 p.
• Size: 24 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.3815/2
• Subject Headings:
  • LCSH : Semiconductors -- Design and construction -- Congresses
  • LCSH : Surface preparation -- Congresses
  • LCSH : Semiconductors -- Cleaning -- Congresses
  • LCSH : Surface chemistry -- Congresses
• Parent Bibliography ID:
  • BA00013775