Stimulated deposition processes and materials aspects of ion beam synthesis : proceedings of Symposium C on Ion Beam, Plasma, Laser, and Thermally-Stimulated Deposition Processes and Symposium G on Materials Aspects of Ion Beam Synthesis: Phase Formation and Modification of the 1993 E-MRS Spring Conference, Strasbourg, France, May 4-7, 1993
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書誌事項
Stimulated deposition processes and materials aspects of ion beam synthesis : proceedings of Symposium C on Ion Beam, Plasma, Laser, and Thermally-Stimulated Deposition Processes and Symposium G on Materials Aspects of Ion Beam Synthesis: Phase Formation and Modification of the 1993 E-MRS Spring Conference, Strasbourg, France, May 4-7, 1993
（European Materials Research Society symposia proceedings, 41）
North-Holland, 1994
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注記
Reprinted from: Thin solid films; 241 (1-2) and Nuclear instruments and methods in physics research B; 84 (2)
内容説明・目次
内容説明
This volume contains the proceedings of Symposium C: Ion Beam, Plasma, Laser, and Thermally-Stimulated Deposition Processes and Symposium G: Material Aspects of Ion Beam Synthesis: Phase Formation and Modification of the E-MRS 1993 Spring conference. Symposium C covers recent trends in the field of deposition processes stimulated by low energy particle beams and shows the wide range of materials which can be modified advantageously by energetic ion and photon bombardment. Topics covered include: sputter-deposition processes; low energy ion-assisted deposition processes and thermally-activitated CVD processes; ion beam-assisted deposition and laser beam-induced modifications of materials. Symposium G brought together scientists and engineers working in similar fields to stimulate further investigations not only of SIN40X but of other materials systems and applications. The topics covered include: recent developments in the science and technology of silicide formation; mechanisms responsible for secondary defect formation in SIMOX materials; the formation and role of synthesised "altered" layers during surface analysis.
目次
Symposium C: Ion Beam, Plasma, Laser and Thermally-Stimulated Deposition Processes. Preface. Sputter-deposition processes. Laser-induced chemical vapour deposition processes. Laser ablation processes. Laser beam-induced surface modifications of materials. Low energy ion-assisted deposition processes. Ion beam-assisted deposition and ion beam mixing. Ion beam-induced structural modifications of materials. Microwave plasma-enhanced chemical vapour deposition processes. Plasma-enhanced chemical vapour deposition of a-c films. Plasma-enhanced chemical vapour deposition processes. Surface chemistry in chemical vapour deposition processes. Chemical vapour deposition processes. Author index. Subject index. Symposium G: Material Aspects of Ion Beam Synthesis: Phase Formation and Modification. Ion beam synthesis of silicides. Ion beam modification and compound formation. SIMOX.
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