Plasma sources for thin film deposition and etching

著者

• Francombe, Maurice H.
• Vossen, John L.

書誌事項

Plasma sources for thin film deposition and etching

edited by Maurice H. Francombe, John L. Vossen

（Physics of thin films : advances in research and development, v. 18）

Academic Press, c1994

注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

目次

Design of High- Density Plasma Sources for Materials Processing M.A. Lieberman and R.A. Gottscho Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films O.A. Popov Unbalanced Magnetron Sputtering S.L. Rohde The Formation of Particles in Thin-Film Processing Plasmas Steinbruchel

「Nielsen BookData」 より

詳細情報

• NII書誌ID(NCID): BA23592456
• ISBN:
  • 0125330189
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: San Diego ; Tokyo
• ページ数/冊数: xii, 328 p.
• 大きさ: 24 cm
• 分類:
  • NDC8 : 549.8
• 親書誌ID:
  • BA04340456