An introduction to physics and technology of thin films

書誌事項

An introduction to physics and technology of thin films

Alfred Wagendristel, Yuming Wang

World Scientific, 1994

大学図書館所蔵 件 / 27

この図書・雑誌をさがす

注記

Includes bibliographical references and index

内容説明・目次

内容説明

Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics — ferromagnetic films, diffusion in thin films and mechanical properties of thin films — are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.

「Nielsen BookData」 より

詳細情報

  • NII書誌ID(NCID)
    BA23602731
  • ISBN
    • 9810216165
  • LCCN
    94013920
  • 出版国コード
    si
  • タイトル言語コード
    eng
  • 本文言語コード
    eng
  • 出版地
    Singapore ; New Jersey
  • ページ数/冊数
    xi, 147 p.
  • 大きさ
    23 cm
  • 分類
  • 件名
ページトップへ