Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Author(s)

    • Dey, Jim
    • Northern California Microphotomask/Masking Working Group

Bibliographic Information

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group

(Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 174)

S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers, c1979

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Note

Proceedings of a seminar

Includes bibliographical references and indexes

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