Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Author(s)

• Dey, Jim
• Northern California Microphotomask/Masking Working Group

Bibliographic Information

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group

（Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 174）

S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers, c1979

Note

Proceedings of a seminar

Includes bibliographical references and indexes

Details

• NCID: BA23874276
• ISBN:
  • 089252202X
• LCCN: 80105579
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: vi, 194 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC : 621.381/74
• Subject Headings:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Thin film circuits -- Congresses
  • LCSH : Microelectronics -- Congresses
• Parent Bibliography ID:
  • BA0118856X