Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

著者

• Dey, Jim
• Northern California Microphotomask/Masking Working Group

書誌事項

Developments in semiconductor microlithography IV : April 23-24, 1979, San Jose, California

Jim Dey, editor ; cooperating organization, Northern California Microphotomask/Masking Working Group

（Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 174）

S.P.I.E.-- the Society of Photo-optical Instrumentation Engineers, c1979

注記

Proceedings of a seminar

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA23874276
• ISBN:
  • 089252202X
• LCCN: 80105579
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: vi, 194 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC : 621.381/74
• 件名:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Microlithography -- Congresses
  • LCSH : Thin film circuits -- Congresses
  • LCSH : Microelectronics -- Congresses
• 親書誌ID:
  • BA0118856X