Control of semiconductor interfaces : proceedings of the First International Symposium on Control of Semiconductor Interfaces, Karuizawa, Japan, 8-12 November 1993

書誌事項

Control of semiconductor interfaces : proceedings of the First International Symposium on Control of Semiconductor Interfaces, Karuizawa, Japan, 8-12 November 1993

edited by I. Ohdomari, M. Oshima, A. Hiraki

Elsevier, c1994

大学図書館所蔵 件 / 8

この図書・雑誌をさがす

注記

Includes bibliographical references and indexes

内容説明・目次

内容説明

These proceedings contain a selection of papers presented at a symposium on semiconductor interfaces. Topics covered include metal/silicon, semiconductor hetero-interface, characterization, semiconducting new materials, control of interface properties and contact metallization.

目次

  • Plenary
  • metal/silicon
  • semiconductor hetero-interface
  • characterization (I)
  • semiconducting new materials
  • metal/compound semiconductor
  • SiO2/Si
  • characterization (II)
  • insulator/semiconductor
  • characterization (III)
  • interface in device
  • control of interface formation - Si
  • control of interface properties - Si
  • contact metallization - Si
  • characterization - Si
  • control of interface formation - compound semiconductors
  • control of interface properties - compound semiconductors
  • contact metallization - compound semiconductors
  • characterization - compound semiconductors. (Part contents).

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