Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California

著者

• Routh, Donald E.
• Society of Photo-optical Instrumentation Engineers
• Northern California Microphotomask/Masking Working Group
• National Aeronautics and Space Administration
• International Society for Hybrid Microelectronics

書誌事項

Developments in semiconductor microlithography, June 1-3, 1976, San Jose, California

Donald E. Routh ... [et al.], editors ; presented by the Society of Photo-optical Instrumentation Engineers and the Northern California Microphotomask/Masking Working Group, in cooperation with National Aeronautics and Space Administration, International Society for Hybrid Microelectronics

（Proceedings of the Society of Photo-Optical Instrumentation Engineers, v. 80）

Society of Photo-optical Instrumentation Engineers, c1976

注記

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA23913119
• ISBN:
  • 0892521074
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Palos Verdes Estates, Calif.
• ページ数/冊数: vi, 146 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC : 621.381/74
• 件名:
  • LCSH : Semiconductors -- Congresses
  • LCSH : Microlithography -- Congresses
• 親書誌ID:
  • BA0118856X