Submicron lithography

著者

• Blais, Phillip D.
• International Society for Hybrid Microelectronics
• Northern California Microphotomask/Masking Working Group
• Materials Research Society

書誌事項

Submicron lithography

Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 333）

International Society for Optical Engineering, 1982

• pbk.

注記

Includes bibliographical references and indexes

詳細情報

• NII書誌ID(NCID): BA23966126
• ISBN:
  • 0892523689
• LCCN: 82060280
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash.
• ページ数/冊数: viii, 179 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7874
  • DC19 : 621.381/74
• 件名:
  • LCSH : Photoresists -- Congresses
  • LCSH : Photolithography -- Congresses
• 親書誌ID:
  • BA0022700X