Submicron lithography

Author(s)

• Blais, Phillip D.
• International Society for Hybrid Microelectronics
• Northern California Microphotomask/Masking Working Group
• Materials Research Society

Bibliographic Information

Submicron lithography

Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 333）

International Society for Optical Engineering, 1982

• pbk.

Note

Includes bibliographical references and indexes

Details

• NCID: BA23966126
• ISBN:
  • 0892523689
• LCCN: 82060280
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash.
• Pages/Volumes: viii, 179 p.
• Size: 28 cm
• Classification:
  • LCC : TK7874
  • DC19 : 621.381/74
• Subject Headings:
  • LCSH : Photoresists -- Congresses
  • LCSH : Photolithography -- Congresses
• Parent Bibliography ID:
  • BA0022700X