Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California

著者

• Stover, Harry L.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California

Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 394）

SPIE--the International Society for Optical Engineering, c1983

• pbk.

タイトル別名

Optical microlithography 2

Optical microlithography two

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA23970961
• ISBN:
  • 0892524294
• LCCN: 83050213
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vi, 251 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TR940
  • DC19 : 621.381/74
• 件名:
  • LCSH : Microlithography -- Congresses
  • LCSH : Integrated circuits -- Very large scale integration -- Congresses
• 親書誌ID:
  • BA0022700X