Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California

著者

• Thompson, L. F.
• International Society for Hybrid Microelectronics
• Society of Photo-optical Instrumentation Engineers

書誌事項

Advances in resist technology and processing II : March 11-12, 1985, Santa Clara, California

Larry F. Thompson, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 539）

SPIE--the International Society for Optical Engineering, c1985

• pbk.

注記

Includes bibliographies and index

詳細情報

• NII書誌ID(NCID): BA23998574
• ISBN:
  • 0892525746
• LCCN: 85050710
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vi, 350 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TR940
  • DC19 : 686.2/325
• 件名:
  • LCSH : Photoresists -- Congresses
• 親書誌ID:
  • BA0022700X