Polymeric materials for microelectronic applications : science and technology
著者
書誌事項
Polymeric materials for microelectronic applications : science and technology
（ACS symposium series, 579）
American Chemical Society, 1994
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注記
"Developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Divisionof Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 Meeting, Kawasaki, Japan, November 15-19, 1993"
Includes bibliographical references and indexes
内容説明・目次
内容説明
Reports recent developments in polymer science and technology pertinent to microelectronics. Addresses such topics as photophysics and radiation physics and chemistry of polymers; photoresists, electron beam resists, and X-ray resists; insulating materials in microelectronics; photoresponsive materials; silicon-containing polymers; conducting polymers; and optoelectronic materials. Includes international contributions from both academia and industry.
目次
- Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids
- Photochemistry of Liquid-Crystalline Polymers
- Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study
- Luminescence Study of Ion-Irradiated Aromatic Polymers
- New Directions in the Design of Chemically Amplified Resist
- Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration
- Importance of Donor-Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists
- Acid Generation in Chemivcally Amplified Resist Films
- Radiation-Induced Reactions of Onium Salts in Novolak
- Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography
- Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanisms of Triaryl Phosphate
- Effect of Water on the Surface Insoluble Layer of Chemical Amplified Positive Resists
- Thermal Properties of a Chemically Amplified Resist Resin
- Modeling and Simulation of Chemically Amplified Resist Systems
- Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air-Polymer Interface
- Surface Imaging for Applications to Sub-0.35- m Lithography
- Molecular Design of Epoxy Resins for Microelectronics Packaging
- Uniaxial and In-Plane Molecular Orientation of Polymides and Their Precursor: Studied by Absorption Dichroism of Perylenebisimide Dye
- Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as A Dissolution Inhibitor
- Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitsive Polyimides
- Waveguiding in High-Temperature-Stable Materials
- Rodlike Fluorinated Polyimide as in In-Plane Birefringent Optical Material
- Preparation of Polyphenylene and Copolymer for Microelectronics Applications
- Charge-Carrier Generation and Migration in a Polydiacetylene compound: Pulse Radiolysis, Time-Resolved Microwave Conductivity Study
- Excitation Dynamics in Conjugated Polymers
- Application of Polyaniline Films to Radiation Dosimetry
- Present and Future of Fullerenes: C[6[0 nd Tubules
- Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components
- Azimuthal Alighment Photocontrol of Piquid Crystals
- Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains
- Electronic Properties of Polysilanes
- UV Photoelectron Spectroscopy of Polysilanes and Polygermanes
- Radical Ions of Polysilynes
- Optical Properties of SIlicon-Based Polymers with Different Backbone Structures
- Synthesis and Properties of Polysilanes Prepared by Ring-Opening Polymerization
- New Synthesis and Functionalization of Photosensitive Poly(silylether) by Addition Reaction of Bisepoxide with Dichlorosilane
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