Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California

著者

• Bondur, James
• Reinberg, Alan R.
• Society of Photo-optical Instrumentation Engineers

書誌事項

Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California

James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1185）

The Society, c1990

注記

Includes bibliographical references and index

詳細情報

• NII書誌ID(NCID): BA24466399
• ISBN:
  • 0819402214
• LCCN: 89043521
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vii, 307 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• 件名:
  • LCSH : Semiconductors -- Etching -- Congresses
  • LCSH : Lithography, Electron beam -- Congresses
  • LCSH : Plasma etching -- Congresses
  • LCSH : Ion beam lithography -- Congresses
• 親書誌ID:
  • BA0022700X