Rapid isothermal processing : 12-13 October 1989, Santa Clara, California

著者

• Singh, Rajendra
• Society of Photo-optical Instrumentation Engineers
• North Carolina State University. Center for Advanced Electronic Materials Processing
• University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing
• SEMATECH (Organization)

書誌事項

Rapid isothermal processing : 12-13 October 1989, Santa Clara, California

Rajendra Singh, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1189）

SPIE, c1990

注記

Includes bibliographical references and index

• NII書誌ID(NCID): BA24466763
• ISBN:
  • 0819402257
• LCCN: 89043525
• 出版国コード: us
• タイトル言語コード: eng
• 本文言語コード: eng
• 出版地: Bellingham, Wash., USA
• ページ数/冊数: vi, 204 p.
• 大きさ: 28 cm
• 分類:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• 件名:
  • LCSH : Semiconductors -- Heat treatment -- Congresses
  • LCSH : Semiconductor doping -- Congresses
  • LCSH : Vapor plating -- Congresses
• 親書誌ID:
  • BA0022700X