Rapid isothermal processing : 12-13 October 1989, Santa Clara, California

Author(s)

• Singh, Rajendra
• Society of Photo-optical Instrumentation Engineers
• North Carolina State University. Center for Advanced Electronic Materials Processing
• University of Wisconsin--Madison. Engineering Research Center for Plasma-Aided Manufacturing
• SEMATECH (Organization)

Bibliographic Information

Rapid isothermal processing : 12-13 October 1989, Santa Clara, California

Rajendra Singh, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, Center for Advanced Electronic Materials Processing/North Carolina State University, Engineering Research Center for Plasma-Aided Manufacturing/University of Wisconsin-Madison, SEMATECH

（Proceedings / SPIE -- the International Society for Optical Engineering, v. 1189）

SPIE, c1990

Note

Includes bibliographical references and index

Details

• NCID: BA24466763
• ISBN:
  • 0819402257
• LCCN: 89043525
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Bellingham, Wash., USA
• Pages/Volumes: vi, 204 p.
• Size: 28 cm
• Classification:
  • LCC : TK7871.85
  • DC20 : 621.381/52
• Subject Headings:
  • LCSH : Semiconductors -- Heat treatment -- Congresses
  • LCSH : Semiconductor doping -- Congresses
  • LCSH : Vapor plating -- Congresses
• Parent Bibliography ID:
  • BA0022700X