Photon-assisted processing of surfaces and thin films : proceedings of Symposium B on Photon-assisted Processing of Surfaces and Thin Films of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994

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書誌事項

Photon-assisted processing of surfaces and thin films : proceedings of Symposium B on Photon-assisted Processing of Surfaces and Thin Films of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994

edited by J. Dieleman, U.K.P. Biermann, P. Hess

(European Materials Research Society symposia proceedings)

North-Holland/Elsevier, 1995

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注記

Includes bibliographical references and index

内容説明・目次

内容説明

The aim of the Symposium on Photon-Assisted Processing of Surfaces and Thin Films was to give particularly European scientists, studying effects of photons - produced by laers and lamps - on deposition, etching and modification of surfaces and thin films, the opportunity to report and discuss recent achievements.

目次

  • Part 1 Laser ablation: process characterization
  • thin film deposition and characterization
  • techniques and applications. Part 2 Photon-induced surface modification: using lamps
  • using lasers. Part 3 Photo-chemical deposition: using lamps
  • using lasers. Part 4 Laser-chemical etching. Part 5 Laser-based thin film diagnostics.

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