Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A.
著者
書誌事項
Chemical vapor deposition of refractory metals and ceramics III : symposium held November 28-30, 1994, Boston, Massachusetts, U.S.A.
（Materials Research Society symposium proceedings, v. 363）
Materials Research Society, c1995
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注記
Includes bibliographical references and index
内容説明・目次
内容説明
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
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