Handbook of multilevel metallization for integrated circuits : materials, technology, and applications

Bibliographic Information

Handbook of multilevel metallization for integrated circuits : materials, technology, and applications

edited by Syd R. Wilson and Clarence J. Tracy, John L. Freeman, Jr

(Materials science and process technology series)

Noyes Publications, c1993

Available at  / 3 libraries

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Note

Includes bibliographical references and index

Description and Table of Contents

Description

The Handbook of Multilevel Metallization for Integrated Circuits answers and important need by pulling together in one volume a thorough technical summary of each of the key areas that make up a multilevel metal system. Included are associated design, analysis, materials, and manufacturing topics. The book then serves three purposes: It functions as a good learning tool for the engineer newly assigned to work in metallization; It serves as a reference text for any MLM engineer, new or experienced, who wishes to refresh their memory. For someone who wants to further specialize in one topical areas, an extensive listing of references has been provided.

Table of Contents

IntroductionSilicides and Contacts for ULSIAluminum Based Multilevel Metallizations in VLSI/ULSICsInorganic DielectricsOrganic Dielectrics in Multilevel Metallization of Integrated CircuitsPlanarization TechniquesLithography and Etch Issues for a Multilevel Metallization SystemElectro- and Stress-Migration in MLM Interconnect StructuresMultilevel Metallization Test VehicleManufacturing and Analytic MethodsCharacterization Techniques for VLSI Multilevel MetallizationElectronic Packaging and its Influences on Integrated Circuit Design and ProcessingFuture Interconnect SystemsReferencesIndex

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