Monte Carlo modeling for electron microscopy and microanalysis

著者

書誌事項

Monte Carlo modeling for electron microscopy and microanalysis

David C. Joy

（Oxford series in optical and imaging sciences, 9）

Oxford University Press, 1995

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注記

Includes bibliographical references

内容説明・目次

内容説明

This book describes how Monte Carlo modeling methods can be applied to Electron Microscopy and Microanalysis. Computer programs for two basic types of Monte carlo simulation are developed from physical models of the electron scattering process; a Single Scattering program capable of high accuracy but requiring long computation times, and a Plural Scattering program which is less accurate but much more rapid. The programs are optimised for use on personal computers and provide a real time graphical display of the interaction. These programs are then used as the starting point for the development of programs aimed at studying particular effects in the electron microscope including backscattering, secondary electron production, EBIC and cathodo- luminescence imaging, and X- ray microanalysis. The computer code is given in a fully annotated format so that it may be readily be modified for use in specific problems. Many examples of the applications of these methods are provided, together with a complete bibliography.

目次

  • Preface
  • 1. An Introducton to Monte Carlo Methods
  • 2. Constructing a Simulation
  • 3. The Single Scattering Model
  • 4. The Plural Scattering Model
  • 5. Practical Applications of Monte Carlo Models
  • 6. Backscattered Electrons
  • 7. Charge Collection Microscopy and Cathodoluminescence
  • 8. Secondary Electrons and Imaging
  • 9. X-ray Production and Micro-Analysis
  • 10. What Next in Monte Carlo Simulations?

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