Amorphous insulating thin films II : proceedings of Symposium A on Amorphous Insulating Thin Films II of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994

Author(s)

• E-MRS Spring Meeting. Symposium A: Amorphous Insulating Thin Films
• Devine, Rod A. B.

Bibliographic Information

Amorphous insulating thin films II : proceedings of Symposium A on Amorphous Insulating Thin Films II of the 1994 E-MRS Spring Conference, Strasbourg, France, May 24-27, 1994

edited by R.A.B. Devine ... [et al.]

（European Materials Research Society symposia proceedings, v. 46）

Elsevier, 1995

Note

Includes bibliographical references and indexes

"Reprinted from: Journal of non-crystalline solids 187(1-3)"--T.p. verso

Description and Table of Contents

Description

These proceedings present an up-to-date review of the research being carried out in the field of amorphous insulating thin films. The papers are presented by scientists representing 20 different countries.

Table of Contents

• General - dielectrics in microelectronics - problems and perspectives, P. Balk
• silicon dioxide, oxidation and unusual structures, burried oxides - where we're going, J.-L. Leray
• silicon dioxide, deposition, fluorinated interlayer dielectric films in ULSI multilayer interconnections, T. Homma
• silicon dioxide, structure, defects and characterization
• silicon dioxide, defects and degradation
• silicon dioxide, charge trapping
• Si/SiO2 interface, characterization and electrical properties, enhanced 1/f noise due to near interfacial oxygen deficiency, D.M. Fleetwood et al
• hydrogen in MOS structures and oxides, theoretical results on hydrogen in MOS systems, A.H. Edwards, chemical reactions of hydrogenous species in Si/SiO2 systems, E.H. Poindexter
• nitrides, structure and defects, structural and bonding properties of amorphous silicon nitride films, S. Hasegaw et al
• silicon nitride, deposition
• ONO and nitrided oxides
• silicon oxynitride and other dielectrics, structural identification of point defects in amorphous silicon oxynitrides, Y. Cros
• high E materials and ferroelectrics
• optical applications, chemical interaction in ion-implanted amorphous SiO2 and application to formation and modification of nanosize colloids, H. Hosono. (Part contents)

by "Nielsen BookData"

• NCID: BA25943937
• ISBN:
  • 0444821619
• Country Code: us
• Title Language Code: eng
• Text Language Code: eng
• Place of Publication: Amsterdam
• Pages/Volumes: xiv, 510 p.
• Size: 29 cm
• Classification:
  • LCC : TK7871.15.F5
  • DC20 : 621.3815/2
• Subject Headings:
  • LCSH : Thin films -- Congreses
  • LCSH : Amorphous semiconductors -- Congresses
  • LCSH : Electric insulators and insulation -- Thin films -- Congresses
• Parent Bibliography ID:
  • BA07004036